A platform for research: civil engineering, architecture and urbanism
Effect of Substrate Temperature on Crystal Orientation and Residual Stress in RF Sputtered Gallium Nitride Films
Effect of Substrate Temperature on Crystal Orientation and Residual Stress in RF Sputtered Gallium Nitride Films
Effect of Substrate Temperature on Crystal Orientation and Residual Stress in RF Sputtered Gallium Nitride Films
Kusaka, K. (author) / Hanabusa, T. (author) / Tominaga, K. (author) / Yamauchi, N. (author) / Denis, S. / Hanabusa, T. / He, B. / Mittemeijer, E. / Nan, J. / Noyan, I. C.
2005-01-01
6 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2002
|Residual stress and crystal orientation in magnetron sputtering Au films
British Library Online Contents | 2003
|Sputtered amorphous carbon nitride films
British Library Online Contents | 1995
|Influence of substrate temperature on the orientation and optical properties of sputtered ZnO films
British Library Online Contents | 2003
|Formation of Gallium Nitride Crystal Loops on Silicon (111) Substrate
British Library Online Contents | 2004
|