Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
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High-temperature in situ cross-sectional transmission electron microscopy investigation of crystallization process of yttrium-stabilized zirconia/Si and yttrium-stabilized zirconia/SiO~x/Si thin films
High-temperature in situ cross-sectional transmission electron microscopy investigation of crystallization process of yttrium-stabilized zirconia/Si and yttrium-stabilized zirconia/SiO~x/Si thin films
High-temperature in situ cross-sectional transmission electron microscopy investigation of crystallization process of yttrium-stabilized zirconia/Si and yttrium-stabilized zirconia/SiO~x/Si thin films
Kiguchi, T. (Autor:in) / Wakiya, N. (Autor:in) / Shinozaki, K. (Autor:in) / Mizutani, N. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 20 ; 1878-1887
01.01.2005
10 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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