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Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide Films
Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide Films
Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide Films
Chen, H.-L. (Autor:in) / Lu, Y.-M. (Autor:in) / Wu, J.-Y. (Autor:in) / Hwang, W.-S. (Autor:in)
01.01.2005
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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