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    Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide Films

    New search for: Chen, H.-L.
    New search for: Lu, Y.-M.
    New search for: Wu, J.-Y.
    New search for: Hwang, W.-S.

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    Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide Films

    New search for: Chen, H.-L.
    New search for: Lu, Y.-M.
    New search for: Wu, J.-Y.
    New search for: Hwang, W.-S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide Films

    New search for: Chen, H.-L.
    New search for: Lu, Y.-M.
    New search for: Wu, J.-Y.
    New search for: Hwang, W.-S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
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    Document information
    Title:

    Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide Films

    Contributors:

    Chen, H.-L. (author) / Lu, Y.-M. (author) / Wu, J.-Y. (author) / Hwang, W.-S. (author)

    Published in:

    Special Issue on Lead-Free Soldering in Electronics III ; 2530-2535

    MATERIALS TRANSACTIONS ; 46

    Publication date:

    2005-01-01

    Size:

    6 pages

    ISSN:

    1345-9678

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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