Residual stress and Curie temperature of Fe-N thin films prepared by dc magnetron sputtering at elevated temperature: Fid-Bau Portal

Residual stress and Curie temperature of Fe-N thin films prepared by dc magnetron sputtering at elevated temperature

Li, W. L. / Sun, Y. / Fei, W. D.

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Residual stress and Curie temperature of Fe-N thin films prepared by dc magnetron sputtering at elevated temperature

Li, W. L. / Sun, Y. / Fei, W. D.

Residual stress and Curie temperature of Fe-N thin films prepared by dc magnetron sputtering at elevated temperature

Li, W. L. / Sun, Y. / Fei, W. D.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

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Dokumentinformationen

Ähnliche Titel

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Dokumentinformationen

Titel:

Residual stress and Curie temperature of Fe-N thin films prepared by dc magnetron sputtering at elevated temperature

Beteiligte:

Li, W. L. (Autor:in) / Sun, Y. (Autor:in) / Fei, W. D. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 252 ; 4995-5001

Erscheinungsdatum:

01.01.2006

Format / Umfang:

7 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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