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Properties of ITO thin films deposited by RF magnetron sputtering at elevated substrate temperature
Properties of ITO thin films deposited by RF magnetron sputtering at elevated substrate temperature
Properties of ITO thin films deposited by RF magnetron sputtering at elevated substrate temperature
Terzini, E. (Autor:in) / Thilakan, P. (Autor:in) / Minarini, C. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 77 ; 110 - 114
01.01.2000
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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