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The effect of hydrogen as an additive in reactive ion etching of GaAs for obtaining polished surface
The effect of hydrogen as an additive in reactive ion etching of GaAs for obtaining polished surface
The effect of hydrogen as an additive in reactive ion etching of GaAs for obtaining polished surface
Dultsev, F. N. (Autor:in) / Nenasheva, L. A. (Autor:in)
APPLIED SURFACE SCIENCE ; 253 ; 1287-1290
01.01.2006
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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