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Tantalum-Ruthenium Diffusion Barriers for Contacts to SiC
Tantalum-Ruthenium Diffusion Barriers for Contacts to SiC
Tantalum-Ruthenium Diffusion Barriers for Contacts to SiC
Wang, S. H. (Autor:in) / Arnold, O. (Autor:in) / Eichfeld, C. M. (Autor:in) / Mohney, S. E. (Autor:in) / Adedeji, A. V. (Autor:in) / Williams, J. R. (Autor:in) / Devaty, R. P. / Larkin, D. J. / Saddow, S. E.
01.01.2006
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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