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Tantalum-Ruthenium Diffusion Barriers for Contacts to SiC
Tantalum-Ruthenium Diffusion Barriers for Contacts to SiC
Tantalum-Ruthenium Diffusion Barriers for Contacts to SiC
Wang, S. H. (author) / Arnold, O. (author) / Eichfeld, C. M. (author) / Mohney, S. E. (author) / Adedeji, A. V. (author) / Williams, J. R. (author) / Devaty, R. P. / Larkin, D. J. / Saddow, S. E.
2006-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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