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Dynamical Simulation of SiO~2/4H-SiC(0001) Interface Oxidation Process: from First-Principles
Dynamical Simulation of SiO~2/4H-SiC(0001) Interface Oxidation Process: from First-Principles
Dynamical Simulation of SiO~2/4H-SiC(0001) Interface Oxidation Process: from First-Principles
Ohnuma, T. (Autor:in) / Miyashita, A. (Autor:in) / Iwasawa, M. (Autor:in) / Yoshikawa, M. (Autor:in) / Tsuchida, H. (Autor:in) / Wright, N. / Johnson, C. M. / Vassilevski, K. / Nikitina, I. / Horsfall, A.
01.01.2007
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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