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Dynamical Simulation of SiO~2/4H-SiC Interface on C-Face Oxidation Process: From First Principles
Dynamical Simulation of SiO~2/4H-SiC Interface on C-Face Oxidation Process: From First Principles
Dynamical Simulation of SiO~2/4H-SiC Interface on C-Face Oxidation Process: From First Principles
Ohnuma, T. (Autor:in) / Miyashita, A. (Autor:in) / Iwasawa, M. (Autor:in) / Yoshikawa, M. (Autor:in) / Tsuchida, H. (Autor:in)
MATERIALS SCIENCE FORUM ; 600/603 ; 591-596
01.01.2009
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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