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Damage behavior of Cu-Ta bilayered films under cyclic loading
Damage behavior of Cu-Ta bilayered films under cyclic loading
Damage behavior of Cu-Ta bilayered films under cyclic loading
Zhu, X. F. (Autor:in) / Zhang, G. P. (Autor:in) / Tan, J. (Autor:in) / Liu, Y. (Autor:in) / Zhu, S. J. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 22 ; 2478-2482
01.01.2007
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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