Electropotential-stimulated wear of copper during chemical mechanical planarization

Kulkarni, M. / Ng, D. / Baker, M. et al. | British Library Online Contents | 2007

Chemical roles on Cu-slurry interface during copper chemical mechanical planarization

Li, J. / Liu, Y. / Pan, Y. et al. | British Library Online Contents | 2014

Chemical roles on Cu-slurry interface during copper chemical mechanical planarization

Li, J. / Liu, Y. / Pan, Y. et al. | British Library Online Contents | 2014

Chemical roles on Cu-slurry interface during copper chemical mechanical planarization

Li, J. / Liu, Y. / Pan, Y. et al. | British Library Online Contents | 2014

Chemical mechanical planarization of copper pH effect

Du, T. / Desai, V. | British Library Online Contents | 2003