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Effects of deposition pressure on the properties of transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering
Effects of deposition pressure on the properties of transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering
Effects of deposition pressure on the properties of transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering
Ma, Q. B. (Autor:in) / Ye, Z. Z. (Autor:in) / He, H. P. (Autor:in) / Zhu, L. P. (Autor:in) / Zhao, B. H. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 10 ; 167-172
01.01.2007
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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Transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering at low temperature
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