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Effects of deposition pressure on the properties of transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering
Effects of deposition pressure on the properties of transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering
Effects of deposition pressure on the properties of transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering
Ma, Q. B. (author) / Ye, Z. Z. (author) / He, H. P. (author) / Zhu, L. P. (author) / Zhao, B. H. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 10 ; 167-172
2007-01-01
6 pages
Article (Journal)
English
DDC:
621.38152
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Transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering at low temperature
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