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Local field-emission characteristic of individual AlN cone fabricated by focused ion-beam etching method
Local field-emission characteristic of individual AlN cone fabricated by focused ion-beam etching method
Local field-emission characteristic of individual AlN cone fabricated by focused ion-beam etching method
Li, Y. L. (Autor:in) / Shi, C. Y. (Autor:in) / Li, J. J. (Autor:in) / Gu, C. Z. (Autor:in)
APPLIED SURFACE SCIENCE ; 254 ; 4840-4844
01.01.2008
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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