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Local field-emission characteristic of individual AlN cone fabricated by focused ion-beam etching method

Li, Y. L. / Shi, C. Y. / Li, J. J. / Gu, C. Z.

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Local field-emission characteristic of individual AlN cone fabricated by focused ion-beam etching method

Li, Y. L. / Shi, C. Y. / Li, J. J. / Gu, C. Z.

Local field-emission characteristic of individual AlN cone fabricated by focused ion-beam etching method

Li, Y. L. / Shi, C. Y. / Li, J. J. / Gu, C. Z.

Access

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Local field-emission characteristic of individual AlN cone fabricated by focused ion-beam etching method

Contributors:

Li, Y. L. (author) / Shi, C. Y. (author) / Li, J. J. (author) / Gu, C. Z. (author)

Published in:

APPLIED SURFACE SCIENCE ; 254 ; 4840-4844

Publication date:

2008-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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