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Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning
Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning
Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning
Lee, T. C. (Autor:in) / Chen, P. C. (Autor:in) / Lai, T. Y. (Autor:in) / Tuntiwechapikul, W. (Autor:in) / Kim, J. H. (Autor:in) / Lee, T. R. (Autor:in)
APPLIED SURFACE SCIENCE ; 254 ; 7064-7068
01.01.2008
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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