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Hardness and residual stress in nanocrystalline ZrN films: Effect of bias voltage and heat treatment
Hardness and residual stress in nanocrystalline ZrN films: Effect of bias voltage and heat treatment
Hardness and residual stress in nanocrystalline ZrN films: Effect of bias voltage and heat treatment
Tung, H. M. (Autor:in) / Huang, J. H. (Autor:in) / Tsai, D. G. (Autor:in) / Ai, C. F. (Autor:in) / Yu, G. P. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING A ; 500 ; 104-108
01.01.2009
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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