Hardness and residual stress in nanocrystalline ZrN films: Effect of bias voltage and heat treatment: Fid-Bau Portal

Hardness and residual stress in nanocrystalline ZrN films: Effect of bias voltage and heat treatment

Tung, H. M. / Huang, J. H. / Tsai, D. G. / Ai, C. F. / Yu, G. P.

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Hardness and residual stress in nanocrystalline ZrN films: Effect of bias voltage and heat treatment

Tung, H. M. / Huang, J. H. / Tsai, D. G. / Ai, C. F. / Yu, G. P.

Hardness and residual stress in nanocrystalline ZrN films: Effect of bias voltage and heat treatment

Tung, H. M. / Huang, J. H. / Tsai, D. G. / Ai, C. F. / Yu, G. P.

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Document information

Title:

Hardness and residual stress in nanocrystalline ZrN films: Effect of bias voltage and heat treatment

Contributors:

Tung, H. M. (author) / Huang, J. H. (author) / Tsai, D. G. (author) / Ai, C. F. (author) / Yu, G. P. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING A ; 500 ; 104-108

Publication date:

2009-01-01

Size:

5 pages

ISSN:

0921-5093

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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