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Mechanism of the etching rate change of aluminosilicate glass in HF acid with micro-indentation
Mechanism of the etching rate change of aluminosilicate glass in HF acid with micro-indentation
Mechanism of the etching rate change of aluminosilicate glass in HF acid with micro-indentation
Saito, Y. (Autor:in) / Okamoto, S. (Autor:in) / Inomata, H. (Autor:in) / Kurachi, J. (Autor:in)
APPLIED SURFACE SCIENCE ; 255 ; 2290-2294
01.01.2008
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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