Nanostructured CrAlN Films Prepared at Different Pulse Widths by Pulsed DC Reactive Sputtering in Facing Target Type System: Fid-Bau Portal

Nanostructured CrAlN Films Prepared at Different Pulse Widths by Pulsed DC Reactive Sputtering in Facing Target Type System

Khamseh, S. / Nose, M. / Ueda, S. / Kawabata, T. / Nagae, T. / Matsuda, K. / Ikeno, S.

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Nanostructured CrAlN Films Prepared at Different Pulse Widths by Pulsed DC Reactive Sputtering in Facing Target Type System

Khamseh, S. / Nose, M. / Ueda, S. / Kawabata, T. / Nagae, T. / Matsuda, K. / Ikeno, S.

Nanostructured CrAlN Films Prepared at Different Pulse Widths by Pulsed DC Reactive Sputtering in Facing Target Type System

Khamseh, S. / Nose, M. / Ueda, S. / Kawabata, T. / Nagae, T. / Matsuda, K. / Ikeno, S.

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Verfügbarkeit in meiner Bibliothek prüfen

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Ähnliche Titel

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Titel:

Nanostructured CrAlN Films Prepared at Different Pulse Widths by Pulsed DC Reactive Sputtering in Facing Target Type System

Beteiligte:

Khamseh, S. (Autor:in) / Nose, M. (Autor:in) / Ueda, S. (Autor:in) / Kawabata, T. (Autor:in) / Nagae, T. (Autor:in) / Matsuda, K. (Autor:in) / Ikeno, S. (Autor:in)

Erschienen in:

MATERIALS TRANSACTIONS ; 49 ; 2737-2742

Erscheinungsdatum:

01.01.2008

Format / Umfang:

6 pages

ISSN:

1345-9678

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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