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    Nanostructured CrAlN Films Prepared at Different Pulse Widths by Pulsed DC Reactive Sputtering in Facing Target Type System

    New search for: Khamseh, S.
    New search for: Nose, M.
    New search for: Ueda, S.
    New search for: Kawabata, T.
    New search for: Nagae, T.
    New search for: Matsuda, K.
    New search for: Ikeno, S.

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    Nanostructured CrAlN Films Prepared at Different Pulse Widths by Pulsed DC Reactive Sputtering in Facing Target Type System

    New search for: Khamseh, S.
    New search for: Nose, M.
    New search for: Ueda, S.
    New search for: Kawabata, T.
    New search for: Nagae, T.
    New search for: Matsuda, K.
    New search for: Ikeno, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Nanostructured CrAlN Films Prepared at Different Pulse Widths by Pulsed DC Reactive Sputtering in Facing Target Type System

    New search for: Khamseh, S.
    New search for: Nose, M.
    New search for: Ueda, S.
    New search for: Kawabata, T.
    New search for: Nagae, T.
    New search for: Matsuda, K.
    New search for: Ikeno, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Nanostructured CrAlN Films Prepared at Different Pulse Widths by Pulsed DC Reactive Sputtering in Facing Target Type System

    Contributors:

    Khamseh, S. (author) / Nose, M. (author) / Ueda, S. (author) / Kawabata, T. (author) / Nagae, T. (author) / Matsuda, K. (author) / Ikeno, S. (author)

    Published in:

    MATERIALS TRANSACTIONS ; 49 ; 2737-2742

    Publication date:

    2008-01-01

    Size:

    6 pages

    ISSN:

    1345-9678

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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