Oxidation Resistance of CrAlN Films with Different Microstructures Prepared by Pulsed DC Balanced Magnetron Sputtering System: Fid-Bau Portal

Oxidation Resistance of CrAlN Films with Different Microstructures Prepared by Pulsed DC Balanced Magnetron Sputtering System

Khamseh, S. / Nose, M. / Kawabata, T. / Matsuda, K. / Ikeno, S.

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Oxidation Resistance of CrAlN Films with Different Microstructures Prepared by Pulsed DC Balanced Magnetron Sputtering System

Khamseh, S. / Nose, M. / Kawabata, T. / Matsuda, K. / Ikeno, S.

Oxidation Resistance of CrAlN Films with Different Microstructures Prepared by Pulsed DC Balanced Magnetron Sputtering System

Khamseh, S. / Nose, M. / Kawabata, T. / Matsuda, K. / Ikeno, S.

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Dokumentinformationen

Titel:

Oxidation Resistance of CrAlN Films with Different Microstructures Prepared by Pulsed DC Balanced Magnetron Sputtering System

Beteiligte:

Khamseh, S. (Autor:in) / Nose, M. (Autor:in) / Kawabata, T. (Autor:in) / Matsuda, K. (Autor:in) / Ikeno, S. (Autor:in)

Erschienen in:

MATERIALS TRANSACTIONS ; 51 ; 271-276

Erscheinungsdatum:

01.01.2010

Format / Umfang:

6 pages

ISSN:

1345-9678

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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Lv, Y. / Ji, L. / Liu, X. et al. | British Library Online Contents | 2012

Nanostructured CrN thin films prepared by reactive pulsed DC magnetron sputtering

Elangovan, T. / Kuppusami, P. / Thirumurugesan, R. et al. | British Library Online Contents | 2010

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