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High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation
High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation
High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation
Ellman, M. (Autor:in) / Rodriguez, A. (Autor:in) / Perez, N. (Autor:in) / Echeverria, M. (Autor:in) / Verevkin, Y. K. (Autor:in) / Peng, C. S. (Autor:in) / Berthou, T. (Autor:in) / Wang, Z. (Autor:in) / Olaizola, S. M. (Autor:in) / Ayerdi, I. (Autor:in)
APPLIED SURFACE SCIENCE ; 255 ; 5537-5541
01.01.2009
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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