High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation: Fid-Bau Portal

High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation

Ellman, M. / Rodriguez, A. / Perez, N. / Echeverria, M. / Verevkin, Y. K. / Peng, C. S. / Berthou, T. / Wang, Z. / Olaizola, S. M. / Ayerdi, I.

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High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation

Ellman, M. / Rodriguez, A. / Perez, N. / Echeverria, M. / Verevkin, Y. K. / Peng, C. S. / Berthou, T. / Wang, Z. / Olaizola, S. M. / Ayerdi, I.

High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation

Ellman, M. / Rodriguez, A. / Perez, N. / Echeverria, M. / Verevkin, Y. K. / Peng, C. S. / Berthou, T. / Wang, Z. / Olaizola, S. M. / Ayerdi, I.

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Document information

Title:

High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation

Contributors:

Ellman, M. (author) / Rodriguez, A. (author) / Perez, N. (author) / Echeverria, M. (author) / Verevkin, Y. K. (author) / Peng, C. S. (author) / Berthou, T. (author) / Wang, Z. (author) / Olaizola, S. M. (author) / Ayerdi, I. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 5537-5541

Publication date:

2009-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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