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IP-Dip photoresist surfaces for photonic applications prepared by laser lithography and studied by AFM
IP-Dip photoresist surfaces for photonic applications prepared by laser lithography and studied by AFM
IP-Dip photoresist surfaces for photonic applications prepared by laser lithography and studied by AFM
Durisova, Jana (Autor:in) / Pudis, Dusan (Autor:in) / Goraus, Matej (Autor:in) / Gaso, Peter (Autor:in)
Applied surface science ; 461 ; 108-112
01.01.2018
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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