Morphology and structure of Ti-doped diamond films prepared by microwave plasma chemical vapor deposition

Liu, Xuejie / Lu, Pengfei / Wang, Hongchao et al. | British Library Online Contents | 2018

Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

Wang, Q. / Wang, C. / Wang, Z. et al. | British Library Online Contents | 2008

Plasma Enhanced Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous SiC Films on Si

Wang, Y. / Lin, J. / Feng, Z. C. et al. | British Library Online Contents | 2000

Effects of microwave power and bias voltage on deposition of amorphous hydrogenated carbon films using electron cyclotron resonance plasma chemical vapour deposition

Maruyama, K. / Inoue, T. / Yamamoto, M. et al. | British Library Online Contents | 1994

Field Emission Properties of Nanocrystalline and Amorphous Silicon Carbon Nitride Prepared from Microwave Plasma Chemical Vapor Deposition

Cheng, W. J. / Jiang, J. C. / Zhang, Y. et al. | British Library Online Contents | 2005