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Effect of Gas Pressure on the Boron-Doped Hydrogenated Amorphous Carbon Thin Films Grown by Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

Rusop, M. / Abdullah, S. / Podder, J. et al. | British Library Online Contents | 2006

Crystallization kinetics of hydrogenated amorphous silicon thick films grown by plasma-enhanced chemical vapour deposition

Farjas, J. / Rath, C. / Roura, P. et al. | British Library Online Contents | 2004

Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

Ryu, H.J. / Kim, S.H. / Hong, S.H. | British Library Online Contents | 2000

Effect of hydrogenated amorphous carbon films on nucleation of diamond particles by hot-filament chemical vapor deposition

Tamaki, K. / Nakamura, Y. / Watanabe, Y. et al. | British Library Online Contents | 1995