Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

Wang, Q. / Wang, C. / Wang, Z. et al. | British Library Online Contents | 2008

Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

Ryu, H.J. / Kim, S.H. / Hong, S.H. | British Library Online Contents | 2000

Crystallization kinetics of hydrogenated amorphous silicon thick films grown by plasma-enhanced chemical vapour deposition

Farjas, J. / Rath, C. / Roura, P. et al. | British Library Online Contents | 2004

Effect of Gas Pressure on the Boron-Doped Hydrogenated Amorphous Carbon Thin Films Grown by Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

Rusop, M. / Abdullah, S. / Podder, J. et al. | British Library Online Contents | 2006

Laser Doping and Recrystallization for Amorphous Silicon Films by Plasma-Enhanced Chemical Vapor Deposition

Wuu, D. S. / Lien, S. Y. / Wang, J. H. et al. | British Library Online Contents | 2005