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Molecular Dynamics Simulation of Void Generation during Annealing of Copper Wiring
Molecular Dynamics Simulation of Void Generation during Annealing of Copper Wiring
Molecular Dynamics Simulation of Void Generation during Annealing of Copper Wiring
Nagai, T. (Autor:in) / Sasajima, Y. (Autor:in) / Onuki, J. (Autor:in)
MATERIALS TRANSACTIONS ; 50 ; 2373-2377
01.01.2009
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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