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Epitaxial anatase HfO~2 on high-mobility substrate for ultra-scaled CMOS devices
Epitaxial anatase HfO~2 on high-mobility substrate for ultra-scaled CMOS devices
Epitaxial anatase HfO~2 on high-mobility substrate for ultra-scaled CMOS devices
Debernardi, A. (Autor:in) / Wiemer, C. (Autor:in) / Fanciulli, M. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 11 ; 241-244
01.01.2008
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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