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Atomic-level stress calculation and surface roughness of film deposition process using molecular dynamics simulation
Atomic-level stress calculation and surface roughness of film deposition process using molecular dynamics simulation
Atomic-level stress calculation and surface roughness of film deposition process using molecular dynamics simulation
Hong, Z. H. (Autor:in) / Hwang, S. F. (Autor:in) / Fang, T. H. (Autor:in)
COMPUTATIONAL MATERIALS SCIENCE ; 48 ; 520-528
01.01.2010
9 pages
Aufsatz (Zeitschrift)
Englisch
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