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    Atomic-level stress calculation and surface roughness of film deposition process using molecular dynamics simulation

    New search for: Hong, Z. H.
    New search for: Hwang, S. F.
    New search for: Fang, T. H.

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    Atomic-level stress calculation and surface roughness of film deposition process using molecular dynamics simulation

    New search for: Hong, Z. H.
    New search for: Hwang, S. F.
    New search for: Fang, T. H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Atomic-level stress calculation and surface roughness of film deposition process using molecular dynamics simulation

    New search for: Hong, Z. H.
    New search for: Hwang, S. F.
    New search for: Fang, T. H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Atomic-level stress calculation and surface roughness of film deposition process using molecular dynamics simulation

    Contributors:

    Hong, Z. H. (author) / Hwang, S. F. (author) / Fang, T. H. (author)

    Published in:

    COMPUTATIONAL MATERIALS SCIENCE ; 48 ; 520-528

    Publication date:

    2010-01-01

    Size:

    9 pages

    ISSN:

    0927-0256

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.1 / 510

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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