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Theoretical Simulation of Surface Evolution Using the Random Deposition and Surface Relaxation for Metal Oxide Film in Atomic Layer Deposition
Theoretical Simulation of Surface Evolution Using the Random Deposition and Surface Relaxation for Metal Oxide Film in Atomic Layer Deposition
Theoretical Simulation of Surface Evolution Using the Random Deposition and Surface Relaxation for Metal Oxide Film in Atomic Layer Deposition
Ahn, J.-H. (Autor:in) / Kwon, S.-H. (Autor:in) / Kim, J.-H. (Autor:in) / Kim, J.-Y. (Autor:in) / Kang, S.-W. (Autor:in)
JOURNAL OF MATERIALS SCIENCE AND TECHNOLOGY -SHENYANG- ; 26 ; 371-374
01.01.2010
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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