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4H-SiC Surface Morphology Etched Using ClF~3 Gas
4H-SiC Surface Morphology Etched Using ClF~3 Gas
4H-SiC Surface Morphology Etched Using ClF~3 Gas
Habuka, H. (Autor:in) / Tanaka, K. (Autor:in) / Katsumi, Y. (Autor:in) / Takechi, N. (Autor:in) / Fukae, K. (Autor:in) / Kato, T. (Autor:in) / Bauer, A.J. / Friedrichs, P. / Krieger, M. / Pensl, G.
01.01.2010
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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