Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Modeling of CW laser diode irradiation of amorphous silicon films
Modeling of CW laser diode irradiation of amorphous silicon films
Modeling of CW laser diode irradiation of amorphous silicon films
Said-Bacar, Z. (Autor:in) / Leroy, Y. (Autor:in) / Antoni, F. (Autor:in) / Slaoui, A. (Autor:in) / Fogarassy, E. (Autor:in)
APPLIED SURFACE SCIENCE ; 257 ; 5127-5131
01.01.2011
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Sputtered amorphous silicon thin films for diode laser crystallization
British Library Online Contents | 2012
|Properties of Recrystallized Amorphous Silicon Prepared by XeCl Excimer Laser Irradiation
British Library Online Contents | 1995
|Crystallization of silicon carbide thin films by pulsed laser irradiation
British Library Online Contents | 1996
|British Library Online Contents | 2013
|British Library Online Contents | 2006
|