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The Competitive Reactions in Atomic Layer Deposition of HfO~2, ZrO~2 and Al~2O~3 on Hydroxylated Si(100) Surfaces: A Density Functional Theory Study
The Competitive Reactions in Atomic Layer Deposition of HfO~2, ZrO~2 and Al~2O~3 on Hydroxylated Si(100) Surfaces: A Density Functional Theory Study
The Competitive Reactions in Atomic Layer Deposition of HfO~2, ZrO~2 and Al~2O~3 on Hydroxylated Si(100) Surfaces: A Density Functional Theory Study
Ren, J. (Autor:in) / Zhou, G.F. (Autor:in) / Tan, Y. / Ju, D.
01.01.2011
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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