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    The Competitive Reactions in Atomic Layer Deposition of HfO~2, ZrO~2 and Al~2O~3 on Hydroxylated Si(100) Surfaces: A Density Functional Theory Study

    New search for: Ren, J.
    New search for: Zhou, G.F.
    New search for: Tan, Y.
    New search for: Ju, D.

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    The Competitive Reactions in Atomic Layer Deposition of HfO~2, ZrO~2 and Al~2O~3 on Hydroxylated Si(100) Surfaces: A Density Functional Theory Study

    New search for: Ren, J.
    New search for: Zhou, G.F.
    New search for: Tan, Y.
    New search for: Ju, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    The Competitive Reactions in Atomic Layer Deposition of HfO~2, ZrO~2 and Al~2O~3 on Hydroxylated Si(100) Surfaces: A Density Functional Theory Study

    New search for: Ren, J.
    New search for: Zhou, G.F.
    New search for: Tan, Y.
    New search for: Ju, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    The Competitive Reactions in Atomic Layer Deposition of HfO~2, ZrO~2 and Al~2O~3 on Hydroxylated Si(100) Surfaces: A Density Functional Theory Study

    Contributors:

    Ren, J. (author) / Zhou, G.F. (author) / Tan, Y. / Ju, D.

    Published in:

    Selected, peer reviewed papers from the 7^t^h International Forum on Advanced Material Science and Technology June 26-28, 2011, Dalian, China, IFAMST-7) ; 1249-1252

    MATERIALS SCIENCE FORUM ; 675/677

    Publication date:

    2011-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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