Silicon surface passivation using thin HfO2 films by atomic layer deposition

Gope, J. / Batra, N. / Panigrahi, J. et al. | British Library Online Contents | 2015

Improvement on the electrical characteristics of Pd/HfO2/6H-SiC MIS capacitors using post deposition annealing and post metallization annealing

Esakky, Papanasam / Kailath, Binsu J | British Library Online Contents | 2017

Improvement on the electrical characteristics of Pd/HfO2/6H-SiC MIS capacitors using post deposition annealing and post metallization annealing

Esakky, Papanasam / Kailath, Binsu J | British Library Online Contents | 2017

Transmission electron microscopy studies of HfO2 thin films grown by chloride-based atomic layer deposition

Mitchell, D. R. / Aidla, A. / Aarik, J. | British Library Online Contents | 2006

Reliability assessment of ultra-thin HfO2 films deposited on silicon wafer

Fu, W. E. / Chang, C. W. / Chang, Y. Q. et al. | British Library Online Contents | 2012