Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering: Fid-Bau Portal

Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering

Nair, P. B. / Justinvictor, V. B. / Daniel, G. P. / Joy, K. / Ramakrishnan, V. / Thomas, P. V.

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Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering

Nair, P. B. / Justinvictor, V. B. / Daniel, G. P. / Joy, K. / Ramakrishnan, V. / Thomas, P. V.

Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering

Nair, P. B. / Justinvictor, V. B. / Daniel, G. P. / Joy, K. / Ramakrishnan, V. / Thomas, P. V.

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Titel:

Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering

Beteiligte:

Nair, P. B. (Autor:in) / Justinvictor, V. B. (Autor:in) / Daniel, G. P. (Autor:in) / Joy, K. (Autor:in) / Ramakrishnan, V. (Autor:in) / Thomas, P. V. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 257 ; 10869-10875

Erscheinungsdatum:

01.01.2011

Format / Umfang:

7 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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