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Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering
Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering
Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering
Nair, P. B. (author) / Justinvictor, V. B. (author) / Daniel, G. P. (author) / Joy, K. (author) / Ramakrishnan, V. (author) / Thomas, P. V. (author)
APPLIED SURFACE SCIENCE ; 257 ; 10869-10875
2011-01-01
7 pages
Article (Journal)
English
DDC:
621.35
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