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Evolution of the Al2O3/Ge(100) interface for reactively sputter-deposited films submitted to postdeposition anneals
Evolution of the Al2O3/Ge(100) interface for reactively sputter-deposited films submitted to postdeposition anneals
Evolution of the Al2O3/Ge(100) interface for reactively sputter-deposited films submitted to postdeposition anneals
Bom, N. M. (Autor:in) / Soares, G. V. (Autor:in) / Krug, C. (Autor:in) / Pezzi, R. P. (Autor:in) / Baumvol, I. J. (Autor:in) / Radtke, C. (Autor:in)
APPLIED SURFACE SCIENCE ; 258 ; 5707-5711
01.01.2012
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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