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    Evolution of the Al2O3/Ge(100) interface for reactively sputter-deposited films submitted to postdeposition anneals

    New search for: Bom, N. M.
    New search for: Soares, G. V.
    New search for: Krug, C.
    New search for: Pezzi, R. P.
    New search for: Baumvol, I. J.
    New search for: Radtke, C.

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    Evolution of the Al2O3/Ge(100) interface for reactively sputter-deposited films submitted to postdeposition anneals

    New search for: Bom, N. M.
    New search for: Soares, G. V.
    New search for: Krug, C.
    New search for: Pezzi, R. P.
    New search for: Baumvol, I. J.
    New search for: Radtke, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Evolution of the Al2O3/Ge(100) interface for reactively sputter-deposited films submitted to postdeposition anneals

    New search for: Bom, N. M.
    New search for: Soares, G. V.
    New search for: Krug, C.
    New search for: Pezzi, R. P.
    New search for: Baumvol, I. J.
    New search for: Radtke, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Evolution of the Al2O3/Ge(100) interface for reactively sputter-deposited films submitted to postdeposition anneals

    Contributors:

    Bom, N. M. (author) / Soares, G. V. (author) / Krug, C. (author) / Pezzi, R. P. (author) / Baumvol, I. J. (author) / Radtke, C. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 258 ; 5707-5711

    Publication date:

    2012-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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