Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Reactive ion etching of GaN and AlGaN/GaN assisted by Cl2/BCl3
Reactive ion etching of GaN and AlGaN/GaN assisted by Cl2/BCl3
Reactive ion etching of GaN and AlGaN/GaN assisted by Cl2/BCl3
Gryglewicz, J. (Autor:in) / Oleszkiewicz, W. (Autor:in) / Rami?czek-Krasowska, M. (Autor:in) / Szyszka, A. (Autor:in) / Pra?mowska, J. (Autor:in) / Paszkiewicz, B. (Autor:in) / Paszkiewicz, R. (Autor:in) / T?acza?a, M. (Autor:in)
MATERIALS SCIENCE -WROCLAW- ; 29 ; 260-265
01.01.2011
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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