Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Comparison of planar inductively coupled plasma etching of GaAs in BCl3, BCl3/Ar, and BCl3/Ne
Comparison of planar inductively coupled plasma etching of GaAs in BCl3, BCl3/Ar, and BCl3/Ne
Comparison of planar inductively coupled plasma etching of GaAs in BCl3, BCl3/Ar, and BCl3/Ne
Lee, J. W. (Autor:in) / Lim, Y. T. (Autor:in) / Baek, I. K. (Autor:in) / Yoo, S. Y. (Autor:in) / Cho, G. S. (Autor:in) / Jeoin, M. H. (Autor:in) / Leem, J. Y. (Autor:in) / Pearton, S. J. (Autor:in)
APPLIED SURFACE SCIENCE ; 233 ; 402-410
01.01.2004
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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