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Reactive ion etching of GaN and AlGaN/GaN assisted by Cl2/BCl3
Reactive ion etching of GaN and AlGaN/GaN assisted by Cl2/BCl3
Reactive ion etching of GaN and AlGaN/GaN assisted by Cl2/BCl3
Gryglewicz, J. (author) / Oleszkiewicz, W. (author) / Rami?czek-Krasowska, M. (author) / Szyszka, A. (author) / Pra?mowska, J. (author) / Paszkiewicz, B. (author) / Paszkiewicz, R. (author) / T?acza?a, M. (author)
MATERIALS SCIENCE -WROCLAW- ; 29 ; 260-265
2011-01-01
6 pages
Article (Journal)
English
DDC:
620.11
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