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Surface Polishing of 2-Inch 4H-SiC Wafer Using Fe Abrasive Particles
Surface Polishing of 2-Inch 4H-SiC Wafer Using Fe Abrasive Particles
Surface Polishing of 2-Inch 4H-SiC Wafer Using Fe Abrasive Particles
Kubota, A. (Autor:in) / Ichimori, Y. (Autor:in) / Touge, M. (Autor:in)
KEY ENGINEERING MATERIALS ; 516 ; 487-491
01.01.2012
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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