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Structural investigation of nC-Si/SiOx:H thin films from He diluted (SiH4+CO2) plasma at low temperature
Structural investigation of nC-Si/SiOx:H thin films from He diluted (SiH4+CO2) plasma at low temperature
Structural investigation of nC-Si/SiOx:H thin films from He diluted (SiH4+CO2) plasma at low temperature
Samanta, A. (Autor:in) / Das, D. (Autor:in)
APPLIED SURFACE SCIENCE ; 259 ; 477-485
01.01.2012
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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