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Spectroscopic ellipsometry investigation of microcrystalline fractions in p-type hydrogenated microcrystalline silicon oxide (p-μc-SiOx:H) ultra-thin films
Spectroscopic ellipsometry investigation of microcrystalline fractions in p-type hydrogenated microcrystalline silicon oxide (p-μc-SiOx:H) ultra-thin films
Spectroscopic ellipsometry investigation of microcrystalline fractions in p-type hydrogenated microcrystalline silicon oxide (p-μc-SiOx:H) ultra-thin films
Lertvanithphol, T. (Autor:in) / Rakreungdet, W. (Autor:in) / Horprathum, M. (Autor:in) / Eiamchai, P. (Autor:in) / Sritharathikhun, J. (Autor:in) / Inthisang, S. (Autor:in) / Krajangsang, T. (Autor:in) / Sriprapha, K. (Autor:in) / Limwichean, S. (Autor:in) / Nuntawong, N. (Autor:in)
Materials science in semiconductor processing ; 68 ; 327-333
01.01.2017
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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